Electromechanical memory array using nanotube ribbons and method for making same

ABSTRACT

Electromechanical circuits, such as memory cells, and methods for making same are disclosed. The circuits include a structure having electrically conductive traces and supports extending from a surface of the substrate, and nanotube ribbons suspended by the supports that cross the electrically conductive traces, wherein each ribbon comprises one or more nanotubes. The electro-mechanical circuit elements are made by providing a structure having electrically conductive traces and supports, in which the supports extend from a surface of the substrate. A layer of nanotubes is provided over the supports, and portions of the layer of nanotubes are selectively removed to form ribbons of nanotubes that cross the electrically conductive traces. Each ribbon includes one or more nanotubes.

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application is related to the following applications, all ofwhich are filed on the same date that this application is filed, all ofwhich are assigned to the assignee of this application, and all of whichare incorporated by reference in their entirety:

[0002] Hybrid Circuit Having Nanotube Electromechanical Memory (U.S.patent application Ser. No. not yet assigned); and

[0003] Electromechanical Memory Having Cell Selection CircuitryConstructed with Nanotube Technology (U.S. patent application Ser. No.not yet assigned).

BACKGROUND

[0004] 1. Technical Field

[0005] This invention relates in general to nonvolatile memory devicesfor use as memory storage in an electronic device and in particular tononvolatile memory arrays that use electromechanical elements as theindividual memory cells.

[0006] 2. Discussion of Related Art

[0007] Important characteristics for a memory cell in electronic deviceare low cost, nonvolatility, high density, low power, and high speed.Conventional memory solutions include Read Only Memory (ROM),Programmable Read only Memory (PROM), Electrically Programmable Memory(EPROM), Electrically Erasable Programmable Read Only Memory (EEPROM),Dynamic Random Access Memory (DRAM) and Static Random Access Memory(SRAM).

[0008] ROM is relatively low cost but cannot be rewritten. PROM can beelectrically programmed but with only a single write cycle. EPROM hasread cycles that are fast relative to ROM and PROM read cycles, but hasrelatively long erase times and reliability only over a few iterativeread/write cycles. EEPROM (or “Flash”) is inexpensive, and has low powerconsumption but has long write cycles (ms) and low relative speed incomparison to DRAM or SRAM. Flash also has a finite number of read/writecycles leading to low long-term reliability. ROM, PROM, EPROM and EEPROMare all non-volatile, meaning that if power to the memory is interruptedthe memory will retain the information stored in the memory cells.

[0009] DRAM stores charge on transistor gates that act as capacitors butmust be electrically refreshed every few milliseconds complicatingsystem design by requiring separate circuitry to “refresh” the memorycontents before the capacitors discharge. SRAM does not need to berefreshed and is fast relative to DRAM, but has lower density and ismore expensive relative to DRAM. Both SRAM and DRAM are volatile,meaning that if power to the memory is interrupted the memory will losethe information stored in the memory cells.

[0010] Consequently, existing technologies are either non-volatile butare not randomly accessible and have low density, high cost, and limitedability to allow multiples writes with high reliability of the circuit'sfunction, or they are volatile and complicate system design or have lowdensity. Some emerging technologies have attempted to address theseshortcomings.

[0011] For example, magnetic RAM (MRAM) or ferromagnetic RAM (FRAM)utilizes the orientation of magnetization or a ferromagnetic region togenerate a nonvolatile memory cell. MRAM utilizes a magnetoresisitivememory element involving the anisotropic magnetoresistance or giantmagnetoresistance of ferromagnetic materials yielding nonvolatility.Both of these types of memory cells have relatively high resistance andlow-density. A different memory cell based upon magnetic tunneljunctions has also been examined but has not led to large-scalecommercialized MRAM devices. FRAM uses a circuit architecture similar toDRAM but which uses a thin film ferroelectric capacitor. This capacitoris purported to retain its electrical polarization after an externallyapplied electric field is removed yielding a nonvolatile memory. FRAMsuffers from a large memory cell size, and it is difficult tomanufacture as a large-scale integrated component. See U.S. Pat. Nos.4,853,893; 4,888,630; 5,198,994

[0012] Another technology having non-volatile memory is phase changememory. This technology stores information via a structural phase changein thin-film alloys incorporating elements such as selenium ortellurium. These alloys are purported to remain stable in bothcrystalline and amorphous states allowing the formation of a bi-stableswitch. While the nonvolatility condition is met, this technologyappears to suffer from slow operations, difficulty of manufacture andreliability and has not reached a state of commercialization. See U.S.Pat. Nos. 3,448,302; 4,845,533; 4,876,667; 6,044,008.

[0013] Wire crossbar memory (MWCM) has also been proposed. See U.S. Pat.Nos. 6,128,214; 6,159,620; 6,198,655. These memory proposals envisionmolecules as bi-stable switches. Two wires (either a metal orsemiconducting type) have a layer of molecules or molecule compoundssandwiched in between. Chemical assembly and electrochemical oxidationor reduction are used to generate an “on” or “off” state. This form ofmemory requires highly specialized wire junctions and may not retainnonvolatility owing to the inherent instability found in redoxprocesses.

[0014] Recently, memory devices have been proposed which use nanoscopicwires, such as single-walled carbon nanotubes, to form crossbarjunctions to serve as memory cells. See WO 01/03208, NanoscopicWire-Based Devices, Arrays, and Methods of Their Manufacture; and ThomasRueckes et al., “Carbon Nanotube-Based Nonvolatile Random Access Memoryfor Molecular Computing,” Science, vol. 289, pp. 94-97, 7 July, 2000.Hereinafter these devices are called nanotube wire crossbar memories(NTWCMs). Under these proposals, individual single-walled nanotube wiressuspended over other wires define memory cells. Electrical signals arewritten to one or both wires to cause them to physically attract orrepel relative to one another. Each physical state (i.e., attracted orrepelled wires) corresponds to an electrical state. Repelled wires arean open circuit junction. Attracted wires are a closed state forming arectified junction. When electrical power is removed from the junction,the wires retain their physical (and thus electrical) state therebyforming a non-volatile memory cell.

[0015] The NTWCM proposals to date rely on directed growth or chemicalself-assembly techniques to grow the individual nanotubes needed for thememory cells. These techniques are now believed to be difficult toemploy at commercial scales using modern technology. Moreover, they maycontain inherent limitations such as the length of the nanotubes thatmay be grown reliably using these techniques, and it may difficult tocontrol the statistical variance of geometries of nanotube wires sogrown.

SUMMARY

[0016] The invention provides electromechanical circuits, such as memorycells, and methods for making same. The circuits include a structurehaving electrically conductive traces and supports extending from asurface of the substrate, and nanotube ribbons suspended by the supportsthat cross the electrically conductive traces, wherein each ribboncomprises one or more nanotubes.

[0017] According to one aspect of the invention, the electro-mechanicalcircuit elements are made by providing a structure having electricallyconductive traces and supports, in which the supports extend from asurface of the substrate. A layer of nanotubes is provided over thesupports, and portions of the layer of nanotubes are selectively removedto form ribbons of nanotubes that cross the electrically conductivetraces. Each ribbon includes one or more nanotubes.

BRIEF DESCRIPTION OF THE DRAWING

[0018] In the Drawing,

[0019]FIG. 1 illustrates a nanotube belt crossbar memory deviceaccording to certain embodiments of the invention;

[0020] FIGS. 2A-B illustrate two states of a memory cell according tocertain embodiments of the invention;

[0021]FIG. 3 illustrates acts of making memory devices according tocertain embodiments of the invention;

[0022] FIGS. 4-11 illustrate several forms of creating an intermediatestructure used to make memory devices according to certain embodimentsof the invention;

[0023]FIG. 12 illustrates the non-woven nanotube fabric, or mattednanotube layer, used to make certain embodiments of the invention;

[0024]FIG. 13 illustrates the matted nanotube layer in relation tohidden, underlying traces of certain embodiments of the invention;

[0025]FIG. 14 illustrates addressing logic of certain embodiments of theinvention;

[0026]FIG. 15 illustrates a hybrid technology embodiment of theinvention in which the memory core uses nanotube technology; and

[0027]FIG. 16 illustrates a hybrid technology embodiment of theinvention in which the memory core and addressing lines use nanotuberibbon technology.

DETAILED DESCRIPTION

[0028] Preferred embodiments of the invention provide newelectromechanical memory arrays and methods for making same. Inparticular, electromechanical memory cells are created that operateanaologously to the NTWCM devices disclosed in WO 01/03208, which ishereby incorporated by reference in its entirety. However, unlike theNTWCM devices disclosed in WO 01/03208, preferred embodiments of theinvention replace the suspended nanoscopic wires used in the NTWCMdevices with new ribbons made from a matted layer of nanotubes or anon-woven fabric of nanotubes. These new devices are referred to hereinas nanotube ribbon crossbar memories (NTRCMs). The new nanotube beltstructures are believed to be easier to build at the desired levels ofintegration and scale (in number of devices made) and the geometries aremore easily controlled.

[0029] Because the new nanotube belt crossbar memory devices operateanalogously to NTWCM, the description of their architecture andprinciples of operation is brief. Reference may be made to WO 01/03208for fuller description and background.

[0030]FIG. 1 illustrates an exemplary electromechanical memory array 100constructed according to principles of preferred embodiments of theinvention. The array has a plurality of non volatile memory cells 103which can be in an “on” state 105 or “off” state 106. The actual numberof such cells is immaterial to understanding the invention but thetechnology may support devices having information storage capacitiesequivalent to or larger than modem non-volatile circuit devices.

[0031] Each memory cell 103 includes a nanotube ribbon 101 suspended byone or more supports 102 over electrical traces or wires, e.g., 104.

[0032] Each crossing of a ribbon 101 and a wire, e.g., 104 forms acrossbar junction and defines a memory cell. Under certain embodiments,each cell may be read or written by applying currents and or voltages toelectrodes 112 which are in electrical communication with ribbons 101 orthrough electrodes (not shown) in communication with traces or wires104. The supports 102 are made from a layer 108 of silicon nitride(Si₃N₄). Below layer 108 is a gate oxide layer 109 separating then-doped silicon traces 104 from an underlying silicon wafer 110.

[0033] Referring conjointly to FIGS. 1-2B, junction 106 illustrates thecell in a first physical and electrical state in which the nanotuberibbon 101 is separated from corresponding trace 104. Junction 105illustrates the cell in a second physical and electrical state in whichthe nanotube ribbon 101 is deflected toward corresponding trace 104. Inthe first state, the junction is an open circuit, which may be sensed assuch on either the ribbon 101 or trace 104 when so addressed. In thesecond state, the junction is a rectified junction (e.g., Schottky orPN), which may be sensed as such on either the tube 101 or trace 104when so addressed.

[0034] Under certain embodiments, the nanotube ribbon 101 may be held inposition at the supports by friction. In other embodiments the ribbonmay be held by other means, such as by anchoring the ribbons to thesupports using any of a variety of techniques. This friction can beincreased through the use of chemical interactions including covalentbonding through the use of carbon compounds such as pyrenes or otherchemically reactive species. Evaporated or spin-coated material such asmetals, semiconductors or insulators especially silicon, titanium,silicon oxide or polyimide could also be added to increase the pinningstrength. The nanotube ribbons or individual nanotubes can also bepinned through the use wafer bonding to the surface. See R. J. Chen etal., “Noncovalent Sidewall Functionalization of Single-Walled CarbonNanotubes for Protein Immobiliation,” J.Am. Chem. Soc., 123, 2001,3838-39 and Dai et al., Appl. Phys. Lett., 77, 2000, 3015-17 forexemplary techniques for pinning and coating nanotubes by metals. Seealso WO01/03208 for techniques.

[0035] Under certain preferred embodiments as shown in FIGS. 2A-B, ananotube ribbon 101 has a width of about 180 nm and is pinned to asupport 102 preferably fabricated of silicon nitride. The local area oftrace 104 under ribbon 101 forms an n-doped silicon electrode and ispositioned close to the supports 102 and preferably is no wider than thebelt, e.g., 180 nm. The relative separation 208 from the top of thesupport 102 to the deflected position where the belt 101 attaches toelectrode 206 (see FIG. 2B) should be approximately 5-50 nm. Themagnitude of the separation 208 is designed to be compatible withelectromechanical switching capabilities of the memory device. For thisembodiment, the 5-50 nm separation is preferred for certain embodimentsutilizing ribbons 101 made from carbon nanotubes, but other separationsmay be preferable for other materials. This magnitude arises from theinterplay between strain energy and adhesion energy of the deflectednanotubes. These feature sizes are suggested in view of modernmanufacturing techniques. Other embodiments may be made with muchsmaller (or larger) sizes to reflect the manufacturing equipment'scapabilities.

[0036] The nanotube ribbon 101 of certain embodiments is formed from anon-woven fabric of entangled or matted nanotubes (more below). Theswitching parameters of the ribbon resemble those of individualnanotubes. Thus, the predicted switching times and voltages of theribbon should approximate the same times and voltages of nanotubes.Unlike the prior art which relies on directed growth or chemicalself-assembly of individual nanotubes, preferred embodiments of thepresent invention utilize fabrication techniques involving thin filmsand lithography. This method of fabrication lends itself to generationover large surfaces especially wafers of at least six inches. (Incontrast, growing individual nanotubes over a distance beyond submillimeter distances is currently unfeasible.) The ribbons shouldexhibit improved fault tolerances over individual nanotubes, byproviding redundancy of conduction pathways contained with the ribbons.(If an individual nanotube breaks other tubes within the rib provideconductive paths, whereas if a sole nanotube were used the cell would befaulty.) Moreover, the resistances of the ribbons should besignificantly lower than that for an individual nanotubes, thus,decreasing its impedance, since the ribbons may be made to have largercross-sectional areas than individual nanotubes.

[0037]FIG. 3 illustrates a method of making certain embodiments of NTRCMdevices 100. A first intermediate structure 302 is created or provided.In the illustrated embodiment, the structure 302 includes a siliconsubstrate 110 having an insulating layer 109 (such as silicon dioxide)and a silicon nitride layer (Si₃N₄) 108 that defines a plurality ofsupports 102. In this instance, the supports 102 are formed by rows ofpatterned silicon nitride, though many other arrangements are possible,such as a plurality of columns. Conductive traces 104 extend betweensupports 102. In this instance, the traces 104 are shown as essentiallycontacting the supports 102, but other arrangements are possible as areother geometries; for example, spaces may exist between trace 104 andsupport 102 and trace 104 may be fashioned as a wire or may havenon-rectangular transverse, cross-sections, including triangular ortrapezoidal. Sacrificial layers 304 are disposed above the traces 104 soas to define one planar surface 306 with the upper surface of thesupports 102. This planar surface, as will be explained below,facilitates growth of a matted nanotube layer of certain embodiments.

[0038] Once such a structure 302 is created or provided, the uppersurface 306 receives a catalyst 308. For example, under certainembodiments, a catalyst metal 308, containing iron (Fe), molybdenum(Mo), cobalt or other metals, is applied by spin-coating or otherapplication techniques to create a second intermediate structure 310.

[0039] A matted layer 312 of nanotubes is then grown into a non-wovenfabric of single-walled carbon nanotubes (SWNTs) to form a thirdintermediate structure 314. For example, the second intermediatestructure 310 may be placed into an oven and heated to a hightemperature (for example, about 800-1200° C.) while gases containing acarbon source, hydrogen and inert gas, such as argon or nitrogen, areflowed over the upper surface. This environment facilitates thegeneration or growth of the matted layer or film 312 of single-walledcarbon nanotubes. The layer 312 is primarily one nanotube thick and thevarious tubes adhere to one another via Van der Waals forces.Occasionally, one nanotube grows over the top of another, though thisgrowth is relatively infrequent due to the growth tendencies of thematerial. Under some embodiments (not shown), the catalyst 308 may bepatterned to assist in growing the nanotubes with specific densitieseither more or less dense as is desired. When conditions of catalystcomposition and density, growth environment, and time are properlycontrolled, nanotubes can be made to evenly distribute over a givenfield that is primarily a monolayer of nanotubes. Proper growth requirescontrol of parameters including but not limited to catalyst compositionand concentration, functionialization of the underlying surface, spincoating parameters (length and RPM), growth time, temperature and gasconcentrations.

[0040] A photoresist may then be applied to the layer 312 and patternedto define ribbons in the matted layer of nanotubes 312. The ribbonpatterns cross (for example, perpendicularly) the underlying traces 104.The photoresist is removed to leave ribbons 101 of non-woven nanotubefabric lying on planar surface 306 to form fourth intermediate structure318.

[0041] The fourth intermediate structure 318 has portions 320 of itsunderlying sacrificial layer 304 exposed as shown. The structure 318 isthen treated with an acid, such as HF, to remove the sacrificial layer304, including the portion under the ribbons 101, thus forming an array322 of ribbons 101 suspended over traces 104 and supported by supports102.

[0042] Subsequent metalization may be used to form addressingelectrodes, e.g., 112 shown in FIG. 1.

[0043] One aspect of the above technique is that the various growth,patterning, and etching operations may use conventional techniques, suchas lithographic patterning. Currently, this may entail feature sizes(e.g., width of ribbon 101) of about 180 nm to as low as 130 nm, but thephysical characteristics of the components are amenable to even smallerfeature sizes if manufacturing capabilities permit.

[0044] As will be explained below, there are many possible ways ofcreating the intermediate structures or analogous structures describedabove. FIG. 4, for example, shows one way to create the firstintermediate structure 302

[0045] A silicon wafer 400 is provided with an oxide layer 402. Theoxide layer is preferably a few nanometers in thickness but could be asmuch 1 μm. A silicon nitride (Si₃N₄) layer 404 is deposited on top ofthe oxide surface 402. The silicon nitride layer is preferably at least30 nm thick.

[0046] The silicon nitride layer 404 is then patterned and etched togenerate cavities 406 to form support structure 407. With modemtechniques the cavity width may be about 180 nm wide or perhaps smaller.The remaining silicon nitride material defines the supports 102 (e.g.,as row, or perhaps columns).

[0047] A covering 408 of n-doped silicon is then deposited to fill thecavities 406. The covering 408 for exemplary embodiments may be about 1μm thick but may be as thin as 30 nm.

[0048] The covering 408 is then processed, for example byself-flattening of thick silicon layers or by annealing, to produce aplanar surface 306, discussed above, to form structure 411. In the caseof self-flattening, reactive ion-etching (RIE) with end-point detection(EPD) may be utilized until the upper surface 410 of the etched siliconnitride is reached.

[0049] The structure 411 is then oxidized to form and define sacrificiallayers 304 of SiO₂ about 10-20 nm deep into planar surface 306.

[0050] The unconverted, remaining portions of silicon form traces 104.

[0051]FIG. 5 shows another method that may be used to create the NTRCMdevices 100 of certain embodiments. A support structure 407, like thatdescribed in connection with FIG. 4, is provided. A layer 514 of n-dopedsilicon is then added using a CVD process, sputtering or electroplating.Under certain embodiments, layer 514 is added to be about half theheight of the Si₃N₄ supports 102.

[0052] After the layer 514 is added, an annealing step is performed toyield a planarized surface 306 to form a structure 411 like thatdescribed above. The annealing step causes the silicon of layer 514 toflow into the cavities 406.

[0053] Like that described in connection with FIG. 4, the structure 411is then oxidized to form and define sacrificial layers 304 of SiO₂ about10-20 nm deep into planar surface 306.

[0054]FIG. 6 shows another approach for forming an alternative firstintermediate structure 302′. In this embodiment, a silicon substrate 600is covered with a layer 602 of silicon nitride having a height 604 of atleast 30 nm.

[0055] The silicon nitride layer 602 is then patterned and etched togenerate spacings 606 and to defined supports 102. The etching processexposes a portion 608 of the surface of silicon substrate 600.

[0056] The exposed silicon surface 608 is oxidized to generate a silicondioxide (SiO₂) layers 610 having a thickness of a few nm. These layers610 eventually insulate traces 104 analogously to the way insulatinglayer 109 did for the above described structures 302.

[0057] Once the insulating layers 610 have been created, the traces 104may be created in any of a variety of manner. FIG. 6 illustrates theprocessing steps of FIGS. 4-5 used to create such traces to illustratethis point.

[0058]FIG. 7 shows another approach for forming first intermediatestructure 302. A silicon substrate 700 having a silicon dioxide layer702 and a silicon nitride layer 704 receives a patterned photoresistlayer 706. For example, a photoresist layer may be spin-coated on layer704 and subsequently exposed and lithographically developed.

[0059] Reactive ion etching (RIE) or the like may then be used to etchthe Si₃N₄ layer 704 to form cavities 708 and to define supports 102.

[0060] Afterwards, n-doped silicon 710 may be deposited in the cavities708. Under certain embodiments silicon is deposited to a height aboutequal to the height 712 of the Si₃N₄ supports 102.

[0061] The photoresist 706 and silicon 710 on top of the photoresist 706are then stripped away to form an intermediate structure 411 like thatdescribed above.

[0062] The structure 411 is then oxidized to generate the sacrificialSiO₂ layers 304.

[0063]FIG. 8 shows another approach for forming first intermediatestructure 302. Under this approach, a starting structure 800 is providedhaving a lowest silicon layer 802 with a lowest silicon dioxide layer804 on top of it. A second silicon layer 806 is on top of layer 804 anda second silicon dioxide layer 808 is on top of the second silicon layer806.

[0064] The top silicon dioxide (SiO₂) layer 808 is patterned byphotolithography to create an RIE mask 810. The mask is used to etch theexposed portions 812 of second silicon layer 806 down to the firstsilicon dioxide layer 804. This etching creates cavities 814 and definestraces 104.

[0065] The cavities 814 are filled and covered with silicon nitride(Si₃N₄) 816.

[0066] The Si₃N₄ covering 816 is backetched with RIE to the same height818 as the remaining portions of the SiO₂ layer 806 covering the n-dopedsilicon electrodes 104 (which form the sacrificial layer 304).

[0067]FIG. 9 shows an approach for forming an alternative firstintermediate structure 302″. Under this approach, a structure like 407(shown in FIG. 4, but not FIG. 9) is provided. In this instance, theSi₃N₄ supports 102 have a height of about 30 nm. A thin layer of metal902 is deposited on top of the Si₃N₄ supports 102 and on top of theexposed portions SiO₂ at the bottom of the cavities 904 as depicted byitem 903. Metal 902 and 903 form temporary electrodes. A layer ofn-doped silicon 906 may then be deposited or grown by electroplating,covering the electrode 903 until the silicon 906 achieves a height 908at the top of the support 102 and contacting electrode 902. The growthprocess may be controlled by the onset of a current flow between thelower and upper metal electrodes 902,3.

[0068] The exposed metal electrodes 902 may then be removed by wetchemical methods or dry chemical methods. This forms an intermediatestructure 411′ like the structure 411 described above, but with a buriedelectrode 903, as an artifact of the silicon growing process.

[0069] The structure 411′ is then oxidized to form sacrificial layers304 at the exposed portions of silicon, as described above. For example,the layers 304 may be grown to a thickness of about 10 nm.

[0070]FIG. 10 shows another approach for forming first intermediatestructure 302. A silicon substrate 1002 having a layer of silicondioxide 1004 on top of it and a second layer 1006 of silicon (n-doped)on top of layer 1004 is used as a starting material. A mask layer 1008is photolithographically patterned on top of layer 1006.

[0071] Using nitridization techniques, exposed portions 1010 of n-dopedsilicon layer 1006 are chemically converted to Si₃N₄ supports 102. Theunconverted portions of layer 1006 form traces 104.

[0072] The mask 1008 is removed forming a structure 411 like thatdescribed above.

[0073] The exposed portions 1012 of silicon surface are then oxidized toform the SiO₂ sacrificial layers 304.

[0074]FIG. 11 shows an approach for forming an alternative firstintermediate structure 302′″ Under this approach a silicon substrate1102 is layered with a thin film 1104 of Si₃N₄ as a starting structure.On top of the silicon nitride layer 1104, n-doped silicon is added andlithographically patterned, by RIE, to form traces 104.

[0075] The surfaces of traces 104 are oxidized to form the SiO₂ layer1106 which acts as an alternative form of sacrificial layer 304′.

[0076] The structure is overgrown with Si₃N₄ 1108 and back etched toform a planar surface 306 and to form alternative first intermediatestructure 302′″. As will be evident to those skilled in the art, underthis approach, when the sacrificial layer is subsequently removed,traces 104 will be separated from supports 102. Other variations of thistechnique may be employed to create alternative transversecross-sections of trace 104. For example, the traces 104 may be createdto have a rounded top, or to have a triangular or trapezoidal crosssection. In addition, the cross section may have other forms, such as atriangle with tapered sides.

[0077] As was explained above, once a first intermediate structure isformed, e.g., 302, a matted nanotube layer 312 is provided over theplanar surface 306 of the structure 302. In preferred embodiments, thenon-woven fabric layer 312 is grown over the structure through the useof a catalyst 308 and through the control of a growth environment. Otherembodiments may provide the matted nanotube layer 312 separately andapply it directly over the structure 302. Though structure 302 underthis approach preferably includes the sacrificial layer to provide aplanar surface to receive the independently grown fabric, thesacrificial layer may not be necessary under such an approach.

[0078] Because the growth process causes the underside of such nanotubesto be in contact with planar surface 306 of intermediate structure 302,they exhibit a “self-assembly” trait as is suggested by FIG. 12. Inparticular, individual nanotubes tend to adhere to the surface on whichthey are grown whenever energetically favorable, such that they formsubstantially as a “monolayer.” Some nanotubes may grow over another sothe monolayer is not expected to be perfect. The individual nanotubes donot “weave” with one another but do adhere with one another as aconsequence of Van der Waals forces. FIG. 12 is an approximate depictionof an actual nanotube non-woven fabric. Because of the small featuresizes of nanotube, even modem scanning electron microscopy cannot“photograph” an actual fabric without loss of precision; nanotubes havefeature sizes as small as 1-2 nm which is below the precision of SEM.FIG. 12 for example, suggests the fabric's matted nature; not clear fromthe figure, however, is that the fabric may have small areas ofdiscontinuity with no tubes present. Each tube typically has a diameter1-2 nm (thus defining a fabric layer about 1-2 nm) but may have lengthsof a few microns but may be as long as 200 microns. The tubes may curveand occasionally cross one another. Tubes attach to one another via Vander Waals forces.

[0079] In certain embodiments, nanotubes grow substantially unrestrainedin the x- and y-axis directions, but are substantially restricted in thez-axis (perpendicular to page of FIG. 12) as a consequence of theself-assembly trait. Other embodiments may supplement the above approachto growing matte 312 with the use of field-oriented or flow-orientedgrowth techniques. Such supplementation may be used to further tailorgrowth such that any growth in one planar axis (e.g. the −x-axis) isretarded. This allows for a more even coverage of the desired area witha planar interwoven monolayer coating of nanotubes with a controllabledensity.

[0080] A plan view of the matted nanotube layer 312 with underlyingsilicon traces 104 is shown in FIG. 13.

[0081] As explained above, once the matted nanotube layer 312 isprovided over the surface 306, the layer 312 is patterned and etched todefine ribbons 101 of nanotube fabric that cross the supports 102. Thesacrificial layer is then removed (e.g., with acid) forming the array322 described above in connection with FIG. 3. Because the matted layerof nanotubes 312 form a non-woven fabric that is not a contiguous film,etchants or other chemicals may diffuse between the individual nanotube“fibers” and more easily reach the underlying components, such as thesacrificial layer.

[0082] Subsequent metalization may be used to form addressingelectrodes, e.g., 112 shown in FIG. 1, as outlined above. Otherembodiments use nanotube technology to implement addressing of memorycells instead of using metallized electrodes 112 and addressing lines(not shown).

[0083] More specifically, under certain embodiments described above,nanotubes are used to form NTRCM arrays. Certain embodiments usenanotube technology, whether in individual wire or belt form, toimplement addressing logic to select the memory cell(s) for reading orwriting operations. This approach furthers the integration of nanotubetechnology into system design and may provide beneficial functionalityto higher-level system design. For example, under this approach thememory architecture will not only store memory contents in non-volatilemanner but will inherently store the last memory address.

[0084] The nanotube-based memory cells have bistability characterized bya high ratio of resistance between “0” and “1” states. Switching betweenthese states is accomplished by the application of specific voltagesacross the nanotube belt or wire and the underlying trace, in which atleast one of the memory cell elements is a nanotube or a nanotuberibbon. In one approach, a “readout current” is applied and the voltageacross this junction is determined with a “sense amplifier.” Reads arenon-destructive, meaning that the cell retains its state, and nowrite-back operations are needed as is done with DRAM.

[0085]FIG. 14 depicts a branching binary select system, or decoder,1400. As will be explained below, decoder 1400 may be implemented withnanotubes or nanotube ribbon technology. Moreover, the decoder may beconstructed on the same circuit component as a nanotube memory cellarray, e.g., NTRCM or NTWCM.

[0086] A perpendicular intersection of two lines 1404 and 1406 depictedas a dot 1402 indicates a junction of two nanotubes or nanotube ribbons.In this regard, the interaction is analogous to a “pass transistor”found in CMOS and other technology, in which the intersection may beopened or closed.

[0087] Locations such as 1420 where one nanotube or nanotube ribbon maycross another but which are not intended to create a crossbar junctionmay be insulated from one another with a lithographically patternedinsulator between the components.

[0088] For the sake of clarity, the decoder illustrated is for a 3-bitbinary address carried on addressing lines 1408. Depending on the valueof the encoding the intersections (dots) will be switched to create onlyone path through which sensing current I may pass to select lines 1418.

[0089] To use this technique, a “dual rail” representation 1408 of eachbit of the binary address is fashioned externally so that each of theaddress bits 1410 is presented in true and complementary form. Thus,line 1406 may be the logical true version of address line 1408 a andline 1407 may be the logical complement of address line 1408 a. Thevoltage values of the representation 1408 are consistent with thatneeded to switch a crossbar junction to the “1” or “0” state asdescribed above.

[0090] In this fashion an address 1408 may be used to supply a sensecurrent I to a bit or row of bits in an array, e.g., to nanotubes ornanotube ribbons. Likewise, the same approach may be used to sense agiven trace, for example, selecting specific array column(s) to readsense from in conjunction with selecting a row. Thus this approach maybe used for X and/or Y decoding both for reading and for writingoperations.

[0091] Certain embodiments of the invention provide a hybrid technologycircuit 1500, shown in FIG. 15. A core memory cell array 1502 isconstructed using NTWCM or NTRCM, and that core is surrounded bysemiconductor circuits forming X and Y address decoders 1504 and 1506; Xand Y buffers 1508 and 1510; control logic 1512 and output buffers 1514.The circuitry surrounding the NTWCM or NWBCM core may be used forconventional interfacing functions, including providing read currentsand sensing output voltages.

[0092] In other embodiments, the X and Y address decoders 1504 and 1506may be substituted with the nanotube wire or belt addressing techniquediscussed above. In these embodiments the core would include memorycells and addressing logic.

[0093] In certain embodiments, the hybrid circuit 1500 may be formed byusing a nanotube core (having either just memory cells or memory cellsand addressing logic) and by implementing the surrounding circuitryusing a field programmable gate array. The core and gate array circuitrymay be contained in a single physical package if desired. Or, they maybe packaged separately. For example, a hermitically packaged nanotubecircuit (having memory or memory and addressing logic) may be combinedwith a PLD/FPGA/ASIC in which the I/O interfacing logic is contained.The resulting compact chipset provides access to the benefits of the NTmemory for the user of the product, while maximizing the use of“off-the-shelf” technologies, which may be utilized on an as-neededbasis by the manufacturer.

[0094]FIG. 16 depicts one possible implementation 1600 of the hybridtechnology. A FPGA chip 1602 containing the buffering and control logic(described above) is connected via conducting traces on a (perhapsmultilayer) printed circuit board (PCB) 1604 to a nanotube (NT) chip1606 containing the memory cells and addressing logic.

[0095] This particular embodiment is suggested to conform to the PCI busstandard, typical of today's personal computers. Other passivecircuitry, such as capacitors, resistors, transformers, etc. (notpictured) would also be necessary to conform to the PCI standard. Afront-side bus speed of 200 MHz-400 MHz is annotated, suggesting thekinds of external clock speeds such a chipset might run at. This speedis limited by the PCB interconnects and FPGA/PLD/ASIC speed, and alsothe chip packages, not the NT memory cell speed.

[0096] Other Embodiments

[0097] Besides carbon nanotubes other materials with electronic andmechanical properties suitable for electromechanical switching could beenvisioned. These materials would have properties similar to carbonnanotubes but with different and likely reduced tensile strength. Thetensile strain and adhesion energies of the material must fall within arange to allow bistability of the junction and electromechanicalswitching properties to exist within acceptable tolerances.

[0098] For the purpose of integrating CMOS logic for addressing twoapproaches can be envisioned. In the first embodiment the nanotube arraywill be integrated before metallization but after ion implantation andplanarization of the CMOS logic devices. A second method involves growthof the nanotube arrays before fabrication of the CMOS devices involvingion implementation and high temperature annealing steps. Upon completionof these steps the final metallization of both the nanotube ribbons andthe CMOS devices will proceed using standard and widely used protocols.

[0099] Electrodes consisting of n-doped silicon on top of some metal orsemiconductor line can also be envisioned. This will still providerectifying junctions in the ON state so that no multiple currentpathways exist.

[0100] In addition to rectifying junctions, there are other widelyaccepted and used methods to prevent the occurrence of electricalcrosstalk (i.e. multiple current pathways) in crossbar arrays. Tunnelbarriers on top of the static, lithographically fabricated electrodesprevent the formation of ohmic ON states. No leakage currents at zerobias voltage will occur but a small bias voltage has to be applied forthe charge carriers to overcome this barrier and tunnel between thecrossing lines.

[0101] Methods to increase the adhesion energies through the use ofionic, covalent or other forces can be envisioned to alter theinteractions with the electrode surfaces. These methods can be used toextend the range of bistability with these junctions.

[0102] Nanotubes can be functionalized with planar conjugatedhydrocarbons such as pyrenes which may then aid in enhancing theinternal adhesion between nanotubes within the ribbons.

[0103] Certain of the above aspects, such as the hybrid circuits and thenanotube technology for addressing, are applicable to individualnanotubes (e.g., using directed growth techniques, etc.) or to nanotuberibbons.

[0104] It will be further appreciated that the scope of the presentinvention is not limited to the above-described embodiments but ratheris defined by the appended claims, and that these claims will encompassmodifications of and improvements to what has been described.

What is claimed is:
 1. A method of making electro-mechanical circuitelements comprising the acts of providing a structure havingelectrically conductive traces and supports, the supports extending froma surface of the substrate; providing a layer of nanotubes over thesupports; and selectively removing portions of the layer of nanotubes toform ribbons of nanotubes that cross the electrically conductive traces,wherein each ribbon comprises one or more nanotubes.
 2. The method ofclaim 1 wherein the act of providing a structure provides a structure inwhich the electrically conductive traces are doped silicon traces. 3.The method of claim 1 wherein the act of providing a structure providesa structure in which the electrically conductive traces are nanotubes.4. The method of claim 1 wherein the act of providing a structureprovides a structure in which the electrically conductive traces areribbons of nanotubes.
 5. The method of claim 1 wherein the act ofproviding a structure provides a structure in which the supportstructures are formed as rows of material and wherein the electricallyconductive traces are substantially parallel to the rows.
 6. The methodof claim 5 wherein the traces are separated from the supports.
 7. Themethod of claim 5 wherein the traces contact the supports.
 8. The methodof claim 1 wherein the traces are separated from the supports.
 9. Themethod of claim 1 wherein the traces contact the supports.
 10. Themethod of claim 1 wherein the act of providing a structure provides astructure in which the supports are made from silicon nitride.
 11. Themethod of claim 1 wherein the act of providing a structure provides astructure in which the electrically conductive traces are over a layerof insulating material to electrically isolate the traces relative toone another.
 12. The method of claim 1 wherein the act of providing astructure provides a structure in which the electrically conductivetraces are each over insulating material to electrically isolate thetraces.
 13. The method of claim 1 wherein the act of providing a layerof nanotubes provides a non-woven fabric of nantotubes.
 14. The methodof claim 13 in which the fabric is grown on the structure.
 15. Themethod of claim 13 in which the structure includes a sacrificial layerof material over the traces and in which the fabric is grown over thesacrificial layer.
 16. The method of claim 14 in which the structure istreated with a catalyst to facilitate the growth of the fabric.
 17. Themethod of claim 15 in which an upper surface of the sacrificial layer istreated with a catalyst to facilitate the growth of the fabric.
 18. Themethod of claim 1 in which the act of selectively removing includes theact of patterning and etching the layer of nanotubes to form theribbons.
 19. The method of claim 13 in which the act of selectivelyremoving includes the act of patterning and etching the fabric ofnanotubes to form the ribbons.
 20. The method of claim 14 wherein thegrowth of nanotubes is substantially unrestrained over the surface ofthe structure.
 21. The method of claim 18 wherein the act of patterningand etching uses etchants that diffuse through the fabric.
 22. Themethod of claim 1 wherein the layer of nanotubes is substantially amonolayer.
 23. An electromechanical circuit, comprising: a structurehaving electrically conductive traces and supports extending from asurface of the substrate; nanotube ribbons suspended by the supportsthat cross the electrically conductive traces, wherein each ribboncomprises one or more nanotubes.
 24. The circuit of claim 23 wherein theelectrically conductive traces are doped silicon traces.
 25. The circuitof claim 23 wherein the electrically conductive traces are nanotubes.26. The circuit of claim 23 wherein the electrically conductive tracesare ribbons of nanotubes.
 27. The circuit of claim 23 wherein thesupports are rows of material and wherein the traces are substantiallyparallel to the rows.
 28. The circuit of claim 27 wherein the traces areseparated from the supports.
 29. The circuit of claim 27 wherein thetraces contact the supports.
 30. The circuit of claim 23 wherein thesupports are made from silicon nitride.
 31. The circuit of claim 23wherein the electrically conductive traces are over a layer ofinsulating material to electrically isolate the traces relative to oneanother.
 32. The circuit of claim 23 wherein the electrically conductivetraces are each over insulating material to electrically isolate thetraces.
 33. The circuit of claim 23 wherein ribbons are of a non-wovenfabric of nantotubes.
 34. The circuit of claim 23 wherein the ribbonsare substantially a monolayer of nanotubes.